NEO Semiconductor unveils first silicon prototype of 3D X-DRAM memory

Published on April 24, 2026 | Translated from Spanish

U.S. firm NEO Semiconductor has achieved a significant breakthrough in the field of RAM memory by creating the first functional prototype of its 3D X-DRAM technology on silicon. This design vertically stacks memory cells, emulating the approach of 3D NAND memory, with the goal of increasing storage density and alleviating the global shortage of memory chips. After a year without financial backing, the project is now attracting investors and manufacturers interested in its potential.

Close-up of a bluish silicon chip with vertical layers of luminous cells, stacked like a microscopic skyscraper against a background of golden circuits.

Vertical stacking: the key to greater density 🏗️

The 3D X-DRAM architecture uses layers of memory cells stacked vertically on a silicon substrate, a technique that multiplies capacity per unit area without increasing chip size. Unlike current planar DRAM memories, this design promises to reduce energy consumption and latency by shortening interconnection distances. NEO Semiconductor claims its prototype overcomes the limitations of horizontal scaling, offering a path to manufacture denser and more efficient RAM modules for servers and high-performance devices.

From forgotten project to investor darling 🤑

It's curious that for a year, no one wanted to spend a dime on this idea. Investors must have been very busy looking at cryptocurrency charts or buying shares in virtual pet companies. Now that they see the prototype working, they're scrambling to jump on the bandwagon. Kind of like that classmate you ignore until they get an A+, and suddenly you want to be their friend. Good thing technology doesn't hold grudges, or so it seems.